参数指标
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FEATURE |
DETAILS |
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Substrate |
double-side 2'' diameter standard 3'' and 4'' on request |
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PLD Chamber size |
18'' diameter Spherical chamber standard (Adjustable on request) |
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Base vaccum |
5.0×10-8 Torr standard (at room temperature) |
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Standard armored heater |
≤900°C |
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| Substrate Heating |
Advanced armored heater |
≤1100°C |
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SiC heater |
≤1600°C |
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Nd:YAG Laser (Made in China) |
Selectable wavelength including 266, 355, 532 and 1064 nm |
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Maximum Scanning Range |
60mm（Available to prepare 4’’ film） |
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Process gases |
O2, N2, Ar |
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Annealing Pressure |
≤ 1 atm |
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Target Carousel |
3×2'' diameter standard >3×2'' on request |
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Automation |
Open-source Control System based on LabVIEW |
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产品特点
“大尺寸”旋转辐照加热器
非接触辐照加热，可翻转制备双面薄膜
炉丝密集排布提高加热荷载
耐受1个大气压强以下的纯氧退火气氛
扫描溅射实现“大尺寸”薄膜沉积
极简化的“直线光路”，损耗最低
激光组件整体移动扫描，保证一致性和稳定性
三束激光共同溅射沉积，提高效率
完全开源的软硬件自动化控制系统，支持扫描补偿
产品应用-薄膜制备
SrTiO3 标准参考样品（2英寸）
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SrTiO3 (STO) Film on LaAlO3 substrate |
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Surface Roughness |
0.366 nm (RMS) |
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FWHM |
0.069° |
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Distribution |
Thickness ±0.9% Lattice Constant ±0.08% |
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Growth Speed |
6.7 nm/min |
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YBa2Cu3O7-x 大尺寸薄膜质量（2英寸）
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YBa2Cu3O7-x (YBCO) Film on LaAlO3 substrate |
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Microwave Surface Resistance |
<0.24 mΩ @77 K @10 GHz |
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Critical Current Density |
~ 3.0 MA/cm2 @77 K |
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Surface Roughness |
9.66 nm (RMS) |
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Distribution |
Thickness ±0.46% |
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Growth Speed |
13 nm/min |
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