三光束脉冲激光共沉积系统（3B-PLD）
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产品应用-薄膜制备
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启用国产小型固态脉冲激光器 光路系统模块化整体位移 实现多光束共沉积 自研制大面积加热器 开发控制软件，实现智能操作
| Feature | Details | |
| Substrate | double-side 2'' diameter standard 3'' and 4'' on request | |
| PLD Chamber size | 18'' diameter Spherical chamber standard (Adjustable on request) | |
| Base vaccum | 5.0×10-8 Torr standard (at room temperature) | |
| Standard armored heater | ≤900°C | |
| Substrate Heating | Advanced armored heater | ≤1100°C |
| SiC heater | ≤1600°C | |
| Nd:YAG Laser (Made in China) | Selectable wavelength including 266, 355, 532 and 1064 nm | |
| Maximum Scanning Range | 60mm（Available to prepare 4'' film） | |
| Process gases | O2 , N2 , Ar | |
| Annealing Pressure | ≤ 1 atm | |
| Target Carousel |
3×2'' diameter standard >3×2'' on request |
|
| Automation | Open-source Control System based on LabVIEW | |
“大尺寸”旋转辐照加热器
非接触辐照加热，可翻转制备双面薄膜
炉丝密集排布提高加热荷载
耐受1个大气压强以下的纯氧退火气氛
扫描溅射实现“大尺寸”薄膜沉积
极简化的“直线光路”，损耗最低
激光组件整体移动扫描，保证一致性和稳定性
三束激光共同溅射沉积，提高效率
完全开源的软硬件自动化控制系统，支持扫描补偿
SrTiO3 标准参考样品
 |
SrTiO3 (STO) Film on LaAlO3 substrate |
|
|
Surface Roughness |
0.366 nm (RMS) |
|
|
FWHM |
0.069° |
|
|
Distribution |
Thickness ±0.9% Lattice Constant ±0.08% |
|
|
Growth Speed |
6.7 nm/min |
|
YBa2Cu3O7-x 大尺寸薄膜质量
 |
YBa2Cu3O7-x (YBCO) Film on LaAlO3 substrate |
|
|
Microwave Surface Resistance |
<0.24 mΩ @77 K @10 GHz |
|
|
Critical Current Density |
~ 3.0 MA/cm2 @77 K |
|
|
Surface Roughness |
9.66 nm (RMS) |
|
|
Distribution |
Thickness ±0.46% |
|
|
Growth Speed |
13 nm/min |
|
近期安装
安装单位，时间
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